Pulsed Laser Deposition

Introduction

Pulsed Laser Deposition (PLD) is a thin film deposition technique to deposit the films of the same stoichiometric as that of the target material. The principle of PLD, it involves the physical process of the laser-material interaction (impact of high – power pulsed radiation on solid target), with the formation of plasma plume even the transfer of the ablated material through the plasma plume onto the heated substrate surface.

The important components of PLD include the following:

  1. PLD Chamber
    • Target holder and substrate heater ports
    • View ports of the chamber
    • Laser-beam entrance port
    • To add some more components to the chamber and also used as view ports
  2. Target holder
  3. Substrate heater
  4. Vacuum pump and vacuum measuring unit
  5. Gas InletsHigh Power laser
  6. Target controller